博彩快三

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                电话:0512-65821886 地址:苏州市工业园区新平街⌒ 388号腾飞◥创新园A1栋
                光刻

                MEMS加工-光刻

                光刻是平面型晶体管和集成电路生产中的一个主要工艺。是对半导体晶片表面的掩蔽物(如二氧化硅)进行开孔,以便进行杂质的定域扩散的一种加工技术。
                • 产品介绍
                • 案例展示
                应用材料:
                ● 硅片,玻璃,蓝宝石,柔性材料等
                接触〗式光刻:
                ● 最小图形尺寸:1μm,套刻精度:±0.5μm
                步进式光『刻:
                ● 投影比例1:5,最小图形尺寸:0.35μm ,套刻精度≤0.15μm(X,Y),曝光范围<22*22mm
                电子束光刻:
                ● 最小图形尺寸:10nm,套刻精度:40nm,曝光范围 < 直径100mm
                双面对准光刻:
                ● 最小图形尺寸:1μm,正面套刻精度:±1μm,背面套刻精度:±2μm
                EBL(电子束光刻)
                接触式光刻